Laurell Ws 650 Spin Coater Manual - BONUSMAT.NETLIFY.APP

WS-650 SERIES SPIN PROCESSOR OPERATION MANUAL.
Laurell Spin Coater | McGill Nanotools - Microfab.
Hollow silicon microneedle fabrication using advanced plasma etch.
HIGH REFRACTIVE INDEX NANOCOMPOSITES - Corning Incorporated.
Laurell Spin Processor - WS-650-23 | Centre for Research in.
Core Facilities — York College / CUNY.
Spin-Coater - Materials Science - TU Darmstadt.
PDF Laurell WS-650 Training Checklist - UC Santa Barbara.
Lithography area upgrade | nanoFAB.
An integrated planar magnetic micropump - ScienceDirect.
Laurell ws 650 spin coater manual | Peatix.
Laurell Spin Coater Operation Manual - Harvard Medical School.
MTA PERG.
Nanotools equipment list | McGill Institute for Advanced Materials.

WS-650 SERIES SPIN PROCESSOR OPERATION MANUAL.

LAURELL 650M SPIN COATER USER MANUAL (Can spin up to 6” wafers or 5"x5" samples at 12,00rpm max) A -‐ KEYPAD All operator actions are initiated through the membrane switch keypad, figure 3-‐5. B -‐ RUNNING THE SPIN COATER 1. Press “SELECT PROCESS” key 2. Press “RUN MODE” key to enter a selected program. 3. Open the lid.

Laurell Spin Coater | McGill Nanotools - Microfab.

2) Spin coater (WS-650Mz-23NPPB / Laurell / @ glovebox) 3) Spin coater (SF-100ND / BGK coater) 4) UV curing machine (MT-UV-A 46 / Minuta Tech.) 5) Thermal Evaporator (대동하이텍 / @ glovebox) 6) Forced Convection Oven (OF-01E)... 고두현 교수님 연구실 장비_M (2399k) dhkoland admin,. Automated spin or spray coating or developing with manual wafer load/unload;... Laurell WS-400B-6NPP/LITE Manual tabletop spinner with vacuum check and nitrogen purge, mainly for spin photoresists, support upto 6 inch wafer.... The High resolution direct laser lithography system Dilase 650 offers you the possibility to work with one or two.

Hollow silicon microneedle fabrication using advanced plasma etch.

Ø 200mm Spin Coater WS-650-8 B The Laurell WS-650-8B Spin Coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø200mm wafers and 7" × 7" (178mm × 178mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer). Jump to another model: Options Specs.

HIGH REFRACTIVE INDEX NANOCOMPOSITES - Corning Incorporated.

All information contained in this manual is the property of Laurell Technologies Corporation® and is NOT to be edited, reproduced or distributed without express written permission from a corporate officer. 1 ® WS-400/500B LITE SERIES SPIN PROCESSOR OPERATION MANUAL P/N 10070021F5 APRIL 25, 2005 pg/kv Starting ~S/N: 04460 441 Industrial Drive.

Laurell Spin Processor - WS-650-23 | Centre for Research in.

The curable coating composition was then filtered onto the glass substrate and spin coated at room temperature using a Laurell Model WS-650-23 Spin Coater. Spin coating was accomplished at two speeds for composite coatings formed from curable compositions 1-29: 1000 rpm for 35 sec followed by 3000 rpm for 35 sec. Spin coating was followed by. Various spin-coaters, including Laurell WS-650-8B, with capability to spin substrates up to 300mm. • Optical Lithography. Süss MA6/BA6 Mask Aligner. G-line, i-line and broadband optical exposure tool with resolution... • Z-stack imaging and stitching (manual and automatic) • Powerful image capture and analysis software for measurement. The Laurell WS-650-23B Spin Coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer). Jump to another model: Options Specs Safety Facilities Processes.

Core Facilities — York College / CUNY.

The purpose of this document is to describe requirements and basic operating instructions for the Model Laurell WS-650 Spin Coater. This tool is intended for coating photoresist on samples of various sizes. II. SAFETY a. Be sure that you are trained and signed off to use this equipment. b. Be sure to keep the lid closed before beginning operation. Technique: Spin coating. Acquisition year: 2019. Responsible: Rita Branquinho / Description: The Laurell WS-650-23 spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 102mm × 102mm) substrates and features a maximum rotational speed of 10000 RPM. Spin coater Laurell WS-650Mz-23NPP Spin coater Laurell WS-650Mz-23NPP Device is for: The device is intended for spin coating of thin films from solutions of polymers in organic solvents and other dispersions. The device is in corrosion-proof configuration. The maximum rotational speed is 12,000 RPM, the speed is controllable with 1 RPM increment.

Spin-Coater - Materials Science - TU Darmstadt.

Laurell spin processor WS-650; plasma chamber; AND micro analytical balance BM-20; Yellow Room, 40 m²: Lithography. SÜSS MicroTec MJB4 mask aligner; Laurell spin processor WS-650; Measurement Room, 8 m²: Atomic Force Microscope; Additional Instrumentation: university facilities. high level analytic (surface and bulk) electrical and optical test.

PDF Laurell WS-650 Training Checklist - UC Santa Barbara.

Micro-pistons, monolithically integrated onto a PDMS membrane, were obtained by spin-coating (Laurell WS-650) PDMS pre-polymer onto 200-µm-thick photoresist masters. After spinning, PDMS was baked for 1 h at 80°C for initial curing.... devices were assembled by manual alignment, and bonding of the membrane with micro-piston to the control. Spin-Coater for sample coationg Sample diameter: up to 150 mm (Wafer) Rotation: up to 13000 upm. Skip menu. Quick access {{ child.heading }} {{ child.heading }} Materials Science. Quick access; Deutsch; Search; Login; Open search panel Home of institution.

Lithography area upgrade | nanoFAB.

Laurell Technologies - ø150mm Spin Coater / WS-650-23 System Specifications Process Controller: The 650-series process controller utilizes a robust microprocessor and with the use of its accompanying PC software (written in an object-oriented programming language) it achieves nearly unheard of flexibility both in process definition and use. Section 5 - Appendix. Laurell Technologies. Operations Manual WS-650-Lite Series. WS-650 LITE SERIES SPIN PROCESSOR. All information contained in this manual is the property of Laurell Technologies Corporation® and is NOT to be edited, reproduced or. OPERATION MANUAL. Revision Date: 7/26/2011. Laurell Spin Coater. Standard Operating Procedure (Any question, contact staff 940-369-5318) Revision:1.0 —Last Updated:May 20 /2014 Revised by J.C. Li. Warnings: Your wafer should not be wet or have sticky chemicals of any kind on the back side. If it is, water and chemicals can get pulled into the vacuum line. This will eventually destroy.

An integrated planar magnetic micropump - ScienceDirect.

Spin coater Laurell WS-650-23B (LAURELL) Mask Aligner SÜSS MicroTec MA8 (SUSS-MA8) The Süss MicroTec MA8 is a standard UV lithography tool for exposing wafers through the mask. Exposure can be carried out in proximity mode or in contact mode.... The RCD8 coat and develop platform is equipped with a basic manual spin coater and a GYRSET. Spin coating is a common technique for applying thin films to substrates. When a solution of a material and a solvent is spun at high speeds, the centripetal force and the surface tension of the liquid together create an even covering. After any remaining solvent has evaporated, spin coating results in a thin film ranging from a few nanometres. This 650-series coater system will accommodate up to 150mm wafers and 5&" 5&" (127mm 127mm) substrates, and feat Laurel WS-650 Spincoater. Reserve Equipment. Information the equipment can provide. Intalled in photolithography hood. Spincoater dedicated exclusively for processing of photoresist films. Speeds: 100-12,000 RPM.

Laurell ws 650 spin coater manual | Peatix.

A Laurell WS-650 spin coater was used to coat the wafers with AZ125 NXT photoresist for the bevel and bore patterning process, while a SUSS MicroTec AS8 spray coater was used to deposit AZnLof2070 photoresist for the microneedle shaft patterning. Photolithography resist patterning was hardened using a SUSS MicroTec MA8 UV mask aligner that.

Laurell Spin Coater Operation Manual - Harvard Medical School.

Přístroj slouží k: Laboratorní dvoušnekový vytlačovací stroj s modularními korotujícími šneky o průměru 26 mm a délce 48D. Zařízení má vysokou odolnost korozi a abrazi a umožňuje rychlost otáčení šněků až 1200 rpm, hodinový výkon až 60 kg, dvě pozice pro vrchní plnění práškem či granulemi, dvěma bočními pozicemi pro dávkování prášků či granulí. The resist bi-layer was spun with a Laurell Technologies WS-650-23B spin coater. MicroChem MMA-EL13 (copolymer in ethyl lactate) was used as the high sensitivity bottom undercut layer for all wafers. Zeon Corp. ZEP 520A-7, MicroChem 950k PMMA A4, and AllResist GmbH AR-P 6 200.9 (CSAR) were all tested as the high resolution upper layer.

MTA PERG.

The Laurell WS-650MZ-23NPPB spin coater (SN:16771): is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer). WS-400-6NPP. B. See History tab below for more info. Newer, enhanced replacement model: WS-650-23. Laurell's WS-400 series spin processor, capable of spinning up to ø 150mm wafers and 4" × 4" (102mm × 102mm) substrates. 10,000 RPM (based on a ø 100 mm SEMI Std. wafer). Jump to another model.

Nanotools equipment list | McGill Institute for Advanced Materials.

Laurell Technologies Operations Manual WS-650 Series Revision Date: 12/7/2011 All information contained in this manual is the property of Laurell Technologies Corporation® and is NOT to be edited, reproduced or distributed without express written permission from a corporate officer. 7 1.2.1 LEVEL OF HAZARD INTENSITY. SU-8 precursor was deposited onto IPA and acetone-cleaned glass coverslips via a two-step spin coating (Laurell WS-650 Spin Coater) protocol... (Thermo Fisher 11415064) for 45 min in a 37 °C water bath with manual shaking every 5 min. Gentle mechanical trituration of the digested hearts was next performed with a plastic pipette 10 times in a. All information contained in this manual is the property of Laurell Technologies Corporation® and is NOT to be edited, reproduced or distributed without express written permission from a corporate officer. - 2 - WS-650 SPIN PROCESSOR INCLUDES: 5’ (1.5m) of 0.5” (12.7mm) chemically resistant Tygon exhaust tubing (optional).